TOPTICA presents latest industrial deep UV laser

With its short wavelength and an ultra-narrow laser linewidth, the TopWave 229 provides the key features (< 1 MHz ≙ < 4 x 10-5 cm-1) to take on an important role as excitation source in the field of deep UV Raman and deep UV fluorescence spectroscopy.

Excitation below 250 nm is crucial for fluorescence-free Raman, as this avoids the overlap between the spectral regions of the Raman signal and the native fluorescence. Compared to fluorescence, the Raman effect is orders of magnitude weaker, so that even minimal fluorescence is sufficient to mask Raman emission.

Fluorescence spectroscopy also benefits from the 228.5 nm emission, because it allows the detection of molecules with fluorescence spectra in the range ≤ 270 nm, which can only be excited with shorter wavelength light. As a CW laser system, the TopWave 229 offers another advantage: it avoids non-linear and saturations problems common with pulsed laser sources.

The compact footprint and low heat dissipation of the TopWave 229 laser head allow for easy integration in space restricted and temperature sensitive application environments. Comfortable, hands-off operation over the system lifetime (typ. 10,000 hrs) is ensured by fully automated optimization routines for the internal opto-mechanics. To provide best reliability and consistent, diffraction limited beam quality (M² < 1.3), the complete UV beam path is enclosed in a specially sealed compartment.

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